Materials & Chemicals
Guided Self-Assembly of Block Copolymer Films on Interferometrically Nanopatterned Substrates
Inventors: Paul Nealey, Juan DePablo, Franco Cerrina, Harun Solak, XiaoMin Yang, Richard Peters, Qiang Wang
The Wisconsin Alumni Research Foundation (WARF) is seeking commercial partners interested in developing a new strategy for controlling the ordering of micro-phase separated domains in thin films of self-assembling block copolymers.
Due to the challenges involved in fabricating nanostructures, new techniques and materials are constantly being sought to make nanofabrication easier, cheaper and more versatile. Thin films of materials called block copolymers show tremendous potential in this regard because they self-assemble into ordered, chemically distinct (i.e., micro-phase separated) domains with dimensions in the range of 10 to 50 nm. Block copolymer films are typically used as templates (i.e., resists) for building nanostructures, with line-width, margins and tolerances, and line-edge characteristics that are dictated by thermodynamics rather than standard resist processing.
UW-Madison researchers have developed a new strategy for controlling the ordering of micro-phase separated domains in thin films of self-assembling block copolymers. Using advanced interferometric lithographic techniques, the researchers have created chemically patterned surfaces that act as templates for the self-assembly of block co-polymer films. Extreme ultraviolet interferometric lithography is ideal for this purpose because it produces the periodic surface pattern in the underlying substrate that is needed to guide self-assembly of the periodic domain structure in the overlying block copolymer film.
- Controls ordering and orientation of domains in block copolymers
- Controls the orientation and perfects the ordering of domains in block copolymer films covering large areas (i.e., centimeter to millimeter dimensions)
- Domain structures are suitable as templates for fabricating nanostructures with dimensions in the realm of 10 to 50 nm.