Wisconsin Alumni Research Foundation

Technology

Nanoelectromechanical Switch in Co-Planar Waveguide

Microelectromechanical systems (MEMS) and nanoelectromechanical systems (NEMS) have been used to create mechanical resonators for switching, filtering and other purposes in electrical systems. NEMS/ME...
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Robert Blick, Hua Qin, Hyun-Seok Kim | P07084US

Technology

Silicon-Based, Single Electron Transistor

Because today’s transistors transfer millions of electrons at a time, they generate a large amount of heat when packed together on semiconductor chips. As a result, chips can only contain a set ...
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Robert Blick, Dominik Scheible | P04130US

Technology

Organoelement Resists for EUV Lithography

Extreme ultraviolet (EUV) lithography is one of the most promising techniques for creating semiconductor devices, integrated circuits and microelectronic devices with nanoscale features (i.e., smaller...
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Paul Nealey, Franco Cerrina, Lin Zhu, Junyan Dai, Christopher Ober | P04335US

Technology

Strain-Engineered Ferroelectric Thin Films

Significant efforts are currently underway to create ferroelectric memory (FeRAM) devices from the materials Pb(Zr,Ti)O3 and SrBi2Ta2O9. The main disadvantages of these materials are the volatility of...
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Chang-Beom Eom, Kyoung-Jin Choi, Darrell Schlom, Long-Qing Chen | P05036US

Technology

Efficient Statistical Timing Analysis of Circuits

For integrated circuits, including very large scale integration (VLSI) circuits, to work properly, the signals traveling along the gates and interconnects must be properly timed. Using classical case ...
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Lizheng Zhang, Chung-Ping Chen, Yu Hen Hu | P04377US

Technology

Progressive Random Access Scan Circuitry

Very large scale integrated (VLSI) circuits are tested before use to evaluate reliability and performance. The two most common testing methods are serial-scan and random access scan (RAS). The se...
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Kewal Saluja, Dong Hyun Baik | P06048US

Technology

Directed Assembly of Triblock Copolymers

The current art of nanoscale manufacturing uses self-assembling diblock copolymers to replicate a chemical pattern upwards. This method may be used to replicate a chemical pattern over a large area. H...
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Paul Nealey, Juan DePablo, Frank Bates | P06113US

WARF