Wisconsin Alumni Research Foundation

Technology

Atomic Layer Chemical Patterns For Block Copolymer Assembly

Provided herein are methods of directed self-assembly (DSA) on atomic layer chemical patterns and related compositions. The atomic layer chemical patterns may be formed from two-dimensional materials ...
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Zhenqiang Ma, Paul Nealey, Michael Arnold, Robert Jacobberger, Tzu-Hsuan Chang, Shisheng Xiong | P150238US02

Technology

Block Copolymers for Sub-10 Nanometer Lithography

Block copolymer (BCP) lithography is one of the most powerful technologies of the digital electronics era, allowing millions of nanoscale components to be fabricated on a single chip. BCPs are made o...
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Padma Gopalan, Xiang Yu, Myungwoong Kim, Daniel Sweat | P140025US01

Technology

Degradable Neutral Layer for BCP Lithography

The lithographic process is one of the most powerful technologies of the digital electronics era. Lithography allows hundreds of millions of components to be fabricated on a single chip with pattern f...
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Padma Gopalan, Daniel Sweat, Jonathan Choi, Myungwoong Kim | P130174US01

Technology

Patterned Graphene for Field Effect Transistors

Interest in graphene has surged due to its outstanding electrical properties. Graphene is a two-dimensional, carbon-based material with high tensile strength, stiffness, optical transparency and therm...
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Michael Arnold, Padma Gopalan, Nathaniel Safron, Myungwoong Kim, Jonathan Choi | P110242US01

Technology

Organoelement Resists for EUV Lithography

Extreme ultraviolet (EUV) lithography is one of the most promising techniques for creating semiconductor devices, integrated circuits and microelectronic devices with nanoscale features (i.e., smaller...
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Paul Nealey, Franco Cerrina, Lin Zhu, Junyan Dai, Christopher Ober | P04335US

Technology

Directed Assembly of Triblock Copolymers

The current art of nanoscale manufacturing uses self-assembling diblock copolymers to replicate a chemical pattern upwards. This method may be used to replicate a chemical pattern over a large area. H...
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Paul Nealey, Juan DePablo, Frank Bates | P06113US

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