WARF TECHNOLOGIES

Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.

For More Information About the Inventors

• David Beebe

Tech Fields

• Analytical Instrumentation, Methods & Materials : Microfluidics