Semiconductors & Integrated Circuits
Contact Photolithography-Based Nanopatterning Using Photoresist Features Having Re-Entrant Profiles
Inventors: Zhenqiang Ma, Yei Hwan Jung
Patterning methods for forming patterned device substrates are provided. Also provided are devices made using the methods. The methods utilize photoresist features have re-entrant profiles to form a secondary metal hard mask that can be used to pattern an underlying device substrate.